Nanogap fabrication
Light-matter interaction at the nanoscale is one of the most focused research areas in our group. In this regard, nanofabrication becomes a vital component of our laboratory. A novel fabrication technique called “Atomic Layer Lithography (ALD)” was developed, which combines lithography with atomic layer deposition of alumina to create nanogap with an unprecedented width resolution towards ~1 nm. We could have also developed a technique to fabricate samples with sub-nm width (~3 Å) by using graphene as a spacer (van-der Waals gap).
We are also developing samples with the ability to control the gap-width actively from quantum to classical scale by using external stimuli such as strain, electrically, temperature. We developed “Zero-Nanometer-Gap (zero-gap)” technology and “Closable-Gap” which enables us to control the gap width on an unprecedented scale from quantum to nano to classical gap and vice versa.
![Bama_A](http://faculty.unist.ac.kr/nog/wp-content/uploads/sites/482/2022/01/Bama_A.png)
Atomic layer lithography
Nature Communications 4, 2361 (2013)
![Bama_B](http://faculty.unist.ac.kr/nog/wp-content/uploads/sites/482/2022/01/Bama_B.png)
Zero-nanometer gap technology
Adv. Opt. Mater., 2002164 (2021)
Nano Lett. 21, 4202-4208